Conference Program

TUESDAY | SEPTEMBER 6, 2016

08:40 – 08:50 Welcome Remarks
Plenary
08:50 – 09:30 Karen K. Gleason | Massachusetts Institute of Technology | PLENARY
Synthesizing Polymers by iCVD for Organic Surfaces and Devices
09:30 – 10:10 Hideki Matsumura | Japan Advanced Institute of Science and Technology | PLENARY
Recent Progress of Cat-CVD (HW-CVD) Research in Japan and Other Asian Countries
10:10 – 10:50 R.E.I. (Ruud) Schropp | Eindhoven University of Technology | PLENARY
Frontiers of Hot Wire Chemical Vapor Deposition
10:50 – 11:10 Morning Break
Fundamentals
11:10 – 11:50 Yujun Shi | University of Calgary | INVITED
Study of Decomposition of Methyl-substituted Silane Molecules on Hot Metal Filaments and in the Gas Phase
11:50 – 12:30 Hironobu Umemoto | Shizuoka University | INVITED
Hot Metal Wires as Sinks and Sources of B Atoms
12:30 – 13:30 Lunch Break
Processing I
13:30 – 14:10 Alexey Y. Kovalgin | University of Twente | INVITED
High-Quality Tungsten Films by Hotwire-Assisted CVD/ALD at Low Temperature
14:10 – 14:30 Huynh Thi Cam Tu | Japan Advanced Institute of Science and Technology
Improving passivation quality of Cat-CVD silicon-nitride single layer on crystalline-silicon: How can Cat-doping be applied?
14:30 – 14:50 Yong Liu | Forschungszentrum Jülich
Post-deposition Catalytic-doping of Microcrystalline Silicon Thin-layer for the Application in Silicon Heterojunction Solar Cell
14:50 – 15:10 Takeo Konishi | Japan Advanced Institute of Science and Technology
ITO Sputtering Damage to Cat-CVD Amorphous Silicon Passivation Films and Its Recovery
15:10 – 15:30 Afternoon Break
Processing II
15:30 – 16:10 Kazuya Ichiki | Tokyo Electron Limited | INVITED
Feasibility Study into the Deposition of an Organic Planarization Layer using Sequential Polymerization iCVD (SP-iCVD)
09:30 – 10:10 Markus Höfer | Fraunhofer Institute for Surface Engineering and Thin Films IST | INVITED
HWCVD Processes for Preparing Highly Transparent and Low Stress SiO2 Films for Optical Applications
16:50-17:10 Chia-Yun Hsieh | Drexel University
Directed Surface Growth and Polymer Patterning via Initiated Chemical Vapor Deposition
 
WEDNESDAY | SEPTEMBER 7, 2016
Materials I
08:50 – 09:30 Harv Mahan | U.S. National Renewable Energy Laboratory | INVITED
A Comparison of Crystallite Nucleation and Growth for Thermally Annealed PECVD and HWCVD a-Si:H Films
16:10 – 16:50 Robert Visser | Advanced Materials | INVITED
HWCVD for Creating Polymer Based Optical and Barrier Films on Large Area R2R Equipment
10:10 – 10:30 Keisuke Ohdaira | Japan Advanced Institute of Science and Technology Improved Quality of Flash-Lamp-Crystallized Polycrystalline Silicon Films by Using Low Defect Density Cat-CVD a-Si Films
10:30 – 10:50 Philip Hens | University of Colorado Boulder
Epitaxial growth of cubic silicon carbide on silicon using hot filament CVD
10:50 – 11:10 Morning Break
Materials II
11:10 – 11:50 Anna Maria Coclite | Graz University of Technology | INVITED
Layered Nanostructures in Proton Conductive Polymers Obtained by Initiated Chemical Vapor Deposition
11:50 – 12:10 Priya Moni | Massachusetts Institute of Technology
Systematic surface energy modification by iCVD polymer thin films to control diblock copolymer self assembly for advanced lithography
12:10 – 12:30 Paul Christian | Graz University of Technology
Thermal stability in proton conductive iCVD polymers
12:30 – 13:30 Lunch Break
Materials III
13:30 – 14:10 Nong-Moon Hwang | Seoul National University | INVITED
Non-classical crystallization in the growth of diamond and silicon films in the HWCVD process
14:10 – 14:30 Lothar Schäfer | Fraunhofer Institute for Surface Engineering and Thin Films IST
Uniform bias-enhanced nucleation for hot-filament activated diamond chemical vapor deposition
14:30 – 14:50 Yuki Katamune | Kyushu Institute of Technology
Diamond growth with SiCN interlayer by Hot Filament Chemical Vapor Deposition
14:50 – 15:10 Shinya Ohmagari | National Institute of Advanced Industrial Science and Technology
Homoepitaxial Diamond Growth by Hot-Filament CVD For Future Diamond Power Devices
15:10 – 15:30 Afternoon Break
Poster Session
15:30 – 17:30 Poster Presentations PDF with Poster Presenters
Cummings, Franscious | University of the Western Cape
Electron energy loss spectroscopy and energy filtered transmission electron microscopy of nano-crystalline Si thin films deposited with hydrogen profiling during hot-wire CVD
Dusane, Rajiv | Indian Institute of Technology Bombay
Controlling the orientation of HWCVD grown SiNWs
Dusane, Rajiv | Indian Institute of Technology Bombay
Correlation between Structural, Electrical and Optoelectronic Properties of HWCVD deposited Undoped Microcrystalline Silicon Thin Films
Dutt, Ateet | Universidad Nacional Autónoma de México
Nano-second exciton delay from Silicon oxycarbide thin films deposited using O-Cat-CVD
Hayashida, Shogo | Kyushu Institute of Technology
Electrical and barrier properties of SiCN film deposited by hot-wire chemical vapor deposition
Hsieh, Chia-Yun | Drexel University
Ultrahigh Filler Loading of Polymer Nanocomposites via Initiated Chemical Vapor Deposition
Izumi, Akira | Kyushu Institute of Technology & Top Macoat Co.
Adhesion Properties and Film Qualities of SiCN on Si(100) Deposited by Hot-Wire Chemical Vapor Deposition
Jadkar, Sandesh | Savitribai Phule Pune University
Highly Sensitive Humidity Sensor based on WO3 Thin Film Synthesized by HW-CVD method
Jadkar, Vijaya | Savitribai Phule Pune University
Broadband Photoresponse of Hot Wire-CVD grown nc-Si:H thin films
Kim, Daseul | Seoul National University
Deposition behavior of silicon thin films by hot wire chemical vapor deposition
Koyama, Koichi | Japan Advanced Institute of Science and Technology
Plasma ion implantation to Cat-CVD a-Si passivation films
Lepró, Javier | Lawrence Livermore National Laboratory
Measuring the thermal stress and stability of poly(divinylbenzene) films produced by HWCVD
Pandey, Vivek | Indian Institute of Technology Bombay
Understanding the role of a-Si:H/Al interface in Aluminum Induced Crystallization
Park, Jong-Hwan | Seoul National University
Gas phase generation of diamond nanoparticles in the hot filament chemical vapor deposition reactor
Shi, Yujun | University of Calgary
Catalytic Dissociation of bis(tertiarybutylamino)silane on Hot Tungsten and Tantalum Filaments
Shimizu, Kousako | Nihon University
Fabrication of Excellent a-Si:H and p-i/i-n Interfaces by Sputtering with Supplying Atomic Hydrogen
Umemoto, Hironobu | Shizuoka University
Decomposition Processes of Polymers used for Photoresists by H Atoms Produced on Hot Wire Surfaces
 
THURSDAY | SEPTEMBER 8, 2016
Structures I
08:50 – 09:30 Rajiv O. Dusane | Indian Institute of Technology Bombay | INVITED
A HWCVP based complete recipe for growing SiNWs: Potential and Challenges
09:30 – 09:50 Ateet Dutt | Universidad Nacional Autónoma de México
Full-visible emission from silicon quantum dots in oxide matrix: Role of quantum-dot size
09:50 – 10:10 Cong Thanh Nguyen | Japan Advanced Institute of Science and Technology
Chemical Resistant Silicon Nitride Prepared by Cat-CVD for Solar Cell Application
10:10 – 10:30 Shinya Ohmagari | National Institute of Advanced Industrial Science and Technology
Selective-Area Growth of Single-Crystal Diamond Films by Hot-Filament CVD Using Metal Masks
10:30 – 10:50 Ankur Soam | Indian Institute of Technology Bombay
Formation of Sn nano particles by HWCVD on different substrates
10:50 – 11:10 Morning Break
Structures II
11:10 – 11:50 Malancha Gupta | University of Southern California | INVITED
Fabrication of Gels, Particles, and Membranes Using iCVD
11:50 – 12:10 Jose L. Yagüe | IQS University
Fabrication of Superhydrophobic Copper Surfaces with Hierarchical Structure Developed by Chemical Vapor Deposition Methods
12:10 – 12:30 Laura C. Bradley | University of Southern California
Microstructured Films Formed on Liquid Substrates via Initiated Chemical Vapor Deposition
12:30 – 13:30 Lunch Break
Applications I
13:30 – 14:10 Magnus Bergkvist | SUNY Polytechnic Institute | INVITED
Wafer Scale Solvent-less Adhesive Bonding with iCVD Polyglycidylmethacrylate Thin Films
14:10 – 14:30 Xiaoxue Wang | Massachusetts Institute of Technology
Room Temperature Sensing Based on initiated CVD coated Carbon Nanotube Arrays
14:30 – 14:50 Yuriy Y. Smolin | Drexel University
Integration of Nanoscale Polymer Electrolytes in Dye Sensitized Solar Cells by Initiated Chemical Vapor Deposition
14:50 – 15:10 Minghui Wang | Massachusetts Institute of Technology
Gas Selective Films Deposited by iCVD
15:10 – 15:30 Afternoon Break
CONFERENCE EXCURSION & DINNER
16:00 – 22:00 Social Excursion and Dinner
 
FRIDAY | SEPTEMBER 9, 2016
Applications II
08:50 – 09:30 Keisuke Ohdaira | Japan Advanced Institute of Science and Technology | INVITED
Cat-CVD Silicon Nitride Films and Catalytic Impurity Doping for Application to Silicon-Based Solar Cells
09:30 – 09:50 R.E.I. (Ruud) Schropp | Eindhoven University of Technology
Ultrathin triple solar cells with high rate hot-wire deposited hydrogenated amorphous silicon germanium cells
09:50 – 10:10 Mohit Agarwal | Thapar University & Indian Institute of Technology Bombay
Study of the Effect of Silane Flow on i-a-Si:H/c-Si Hetero-Interface for Silicon Heterojunction Solar Cell Application Fabricated by Hot Wire Chemical Vapor Deposition
10:10 – 10:30 R.E.I. (Ruud) Schropp | Eindhoven University of Technology
Silicon heterojunction solar cells with hot-wire deposited passivation layer
10:30 – 10:50 Amit Pawbake | Savitribai Phule Pune University
Ultrafast Humidity Sensing Behavior of HWCVD Synthesized MoO3 Thin Films
10:50 – 11:10 Morning Break
Applications III
11:10 – 11:50 Jeffrey W. Long | U.S. Naval Research Laboratory | INVITED
Nanoscale Polymers as Solid-State Electrolytes and Dielectrics in Next-Generation 3D Batteries and Capacitors
11:50 – 12:30 Salmaan Baxamusa | Lawrence Livermore National Laboratory | INVITED
Nuclear fusion, microbonding, and more: HWCVD polymers at Lawrence Livermore
12:30 – 13:30 Lunch Break
Commercialization
13:30 – 14:10 W. Shannan O'Shaughnessy | GVD Corporation | INVITED
Commercialization of HWCVD Polymers: Considerations & Case Studies
14:10 – 14:50 R.D. Vispute | Blue Wave Semiconductors, Inc. | INVITED
Advances in Hot Wire CVD tool for fabrication of carbon and silicon based electronic thin films and their emerging applications
14:50 – 15:00 Closing Remarks


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